New models for the simulation of post-exposure bake of chemically amplifed resists.
| Autor: | Matiut, Daniela, Erdmann, Andreas, Tollkuehn, Bernd, Semmler, Armin |
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| Zdroj: | Proceedings of SPIE; Nov2003, Issue 1, p1132-1142, 11p |
| Databáze: | Complementary Index |
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