Novel silicon-containing polymers as photoresist materials for EUV lithography.
| Autor: | Kwark, Young-Je, Bravo-Vasquez, Juan-Pablo, Ober, Christopher K., Cao, Heidi B., Deng, Hai, Meagley, Robert P. |
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| Zdroj: | Proceedings of SPIE; Nov2003, Issue 1, p1204-1211, 8p |
| Databáze: | Complementary Index |
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