Highly etch-selective spin-on bottom antireflective coating for use in 193-nm lithography and beyond.
| Autor: | Pfeiffer, Dirk, Mahorowala, Arpan P., Babich, Katherina, Medeiros, David R., Petrillo, Karen E., Angelopoulos, Marie, Huang, Wu-Song, Halle, Scott, Brodsky, Colin, Allen, Scott D., Holmes, Steven J., Kwong, Ranee W., Lang, Robert, Brock, Phillip J. |
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| Zdroj: | Proceedings of SPIE; Nov2003, Issue 1, p136-143, 8p |
| Databáze: | Complementary Index |
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