Development of high-performance negative-tone resists for 193-nm lithography.
| Autor: | Hattori, Takashi, Yokoyama, Yoshiyuki, Kimura, Kaori, Yamanaka, Ryoko, Tanaka, Toshihiko, Fukuda, Hiroshi |
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| Zdroj: | Proceedings of SPIE; Nov2003, Issue 1, p175-186, 12p |
| Databáze: | Complementary Index |
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