Rational design in cyclic olefin resists for sub-100-nm lithography.
| Autor: | Li, Wenjie, Varanasi, Pushkara R., Lawson, Margaret C., Kwong, Ranee W., Chen, Kuang-Jung, Ito, Hiroshi, Truong, Hoa D., Allen, Robert D., Yamamoto, Masafumi, Kobayashi, Eiichi, Slezak, Mark |
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| Zdroj: | Proceedings of SPIE; Nov2003, Issue 1, p61-69, 9p |
| Databáze: | Complementary Index |
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