New materials for 193-nm bottom antireflective coatings.
| Autor: | Weimer, Marc, Krishnamurthy, Vandana, Fowler, Shelly, Nesbit, Cheryl, Claypool, James B. |
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| Zdroj: | Proceedings of SPIE; Nov2003, Issue 1, p866-871, 6p |
| Databáze: | Complementary Index |
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