Dual-chamber ultra line-narrowed excimer light source for 193-nm lithography.
| Autor: | Fleurov, Vladimir B., Colon III, Daniel J., Brown, Daniel J. W., O'Keeffe, Patrick, Besaucele, Herve, Ershov, Alexander I., Trintchouk, Fedor, Ishihara, T., Zambon, Paolo, Rafac, R. J., Lukashev, A. |
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| Zdroj: | Proceedings of SPIE; Nov2003, Issue 1, p1694-1703, 10p |
| Databáze: | Complementary Index |
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