Scaling rules of phase error control for the manufacturing of alternating phase-shifting masks for 193-nm photolithography and beyond.
| Autor: | Wu, Qiang, Halle, Scott, Bukofsky, Scott J., Butt, Shahid A., Hibbs, Michael S. |
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| Zdroj: | Proceedings of SPIE; Nov2003, Issue 1, p303-312, 10p |
| Databáze: | Complementary Index |
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