Immersion liquids for lithography in the deep ultraviolet.

Autor: Switkes, Michael, Kunz, Roderick R., Sinta, Roger F., Rothschild, Mordechai, Gallagher-Wetmore, Paula M., Krukonis, Val J., Williams, Kara
Zdroj: Proceedings of SPIE; Nov2003, Issue 1, p690-699, 10p
Databáze: Complementary Index