Preliminary microfluidic simulations for immersion lithography.

Autor: Wei, Alexander C., Nellis, Greg F., Abdo, Amr Y., Engelstad, Roxann L., Chen, Cheng-Fu, Switkes, Michael, Rothschild, Mordechai
Zdroj: Proceedings of SPIE; Nov2003, Issue 1, p713-723, 11p
Databáze: Complementary Index