Optical lithography solutions for sub-65-nm semiconductor devices.
Autor: | Mulkens, Jan, McClay, James A., Tirri, Bruce A., Brunotte, Martin, Mecking, Birgit, Jasper, Hans |
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Zdroj: | Proceedings of SPIE; Nov2003, Issue 1, p753-762, 10p |
Databáze: | Complementary Index |
Externí odkaz: |