Current developments of a high-performance CA resist for mask-making application.
| Autor: | Huang, Wu-Song, He, Wei, Li, Wenjie, Moreau, Wayne M., Lang, Robert, Medeiros, David R., Petrillo, Karen E., Mahorowala, Arpan P., Angelopoulos, Marie, Deverich, Christina, Huang, Chester, Rabidoux, Paul A. |
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| Zdroj: | Proceedings of SPIE; Nov2003, Issue 1, p58-66, 9p |
| Databáze: | Complementary Index |
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