Resist heating dependence on subfield scheduling in 50-kV electron beam maskmaking.
Autor: | Babin, Sergey V., Kahng, Andrew B., Mandoiu, Ion, Muddu, Swamy V. |
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Zdroj: | Proceedings of SPIE; Nov2003, Issue 1, p718-726, 9p |
Databáze: | Complementary Index |
Externí odkaz: |