Compensation of long-range process effects on photomasks by design data correction.
| Autor: | Bloecker, Martin, Ballhorn, Gerd, Schneider, Jens, Belic, Nikola, Eisenmann, Hans, Keogan, Danny |
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| Zdroj: | Proceedings of SPIE; Nov2003, Issue 1, p179-188, 10p |
| Databáze: | Complementary Index |
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