Optimization of a 65-nm alternating phase-shift quartz etch process.
| Autor: | Anderson, Scott A., Anderson III, Rex B., Buie, Melisa J., Chandrachood, Madhavi, Clevenger, Jason O., Lee, Yvette, Sandlin, Nicole L., Ding, Jian |
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| Zdroj: | Proceedings of SPIE; Nov2003, Issue 1, p66-75, 10p |
| Databáze: | Complementary Index |
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