Properties of a 248-nm DUV laser mask pattern generator for the 90-nm and 65-nm technology nodes.
| Autor: | Aman, Johan, Fosshaug, Hans A., Hedqvist, Tobias, Harkesjo, Jan, Hogfeldt, Peter, Jacobsson, Marie, Karawajczyk, Andrzej, Karlsson, Johan, Rosling, Mats, Sjoberg, Henrik J. |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2003, Issue 1, p684-694, 11p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|