Optimization of chrome dry etch in Tetra II using asymmetrically loaded patterns.

Autor: Brooks, Cynthia B., Anderson III, Rex B., Clevenger, Jason O., Collard, Corey, Halim, Monika, Sahin, Turgut, Mak, Alfred W.
Zdroj: Proceedings of SPIE; Nov2003, Issue 1, p749-757, 9p
Databáze: Complementary Index