Optimization of chrome dry etch in Tetra II using asymmetrically loaded patterns.
Autor: | Brooks, Cynthia B., Anderson III, Rex B., Clevenger, Jason O., Collard, Corey, Halim, Monika, Sahin, Turgut, Mak, Alfred W. |
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Zdroj: | Proceedings of SPIE; Nov2003, Issue 1, p749-757, 9p |
Databáze: | Complementary Index |
Externí odkaz: |