Integrated phase shift measurements for advanced mask etch process control.

Autor: Sahin, Turgut, Collard, Corey, Anderson, Scott A., Mak, Alfred W., Brooks, Cynthia B., Buie, Melisa J., Walsh, Philip, Li, George
Zdroj: Proceedings of SPIE; Nov2003, Issue 1, p76-84, 9p
Databáze: Complementary Index