Integrated phase shift measurements for advanced mask etch process control.
Autor: | Sahin, Turgut, Collard, Corey, Anderson, Scott A., Mak, Alfred W., Brooks, Cynthia B., Buie, Melisa J., Walsh, Philip, Li, George |
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Zdroj: | Proceedings of SPIE; Nov2003, Issue 1, p76-84, 9p |
Databáze: | Complementary Index |
Externí odkaz: |