Sol-gel fabrication of high-quality photomask substrates for 157-nm lithography.
| Autor: | Ganguli, Rahul, Colbern, Steven G., Morris, Mark W., Meixner, D. Laurence, Chaudhuri, S. Ray |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2003, Issue 1, p913-918, 6p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|