High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV lithography.
| Autor: | Silfvast, William T., Klosner, M., Shimkaveg, Gregory M., Bender, Howard, Kubiak, Glenn D., Fornaciari, Neal R. |
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| Zdroj: | Proceedings of SPIE; Nov1999, Issue 1, p272-275, 4p |
| Databáze: | Complementary Index |
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