UVN2-negative chemically amplified resist optimization for x-ray mask fabrication.
| Autor: | Rocque, Janet M., Lercel, Michael J., Brooks, Cameron J., Henry, Richard W., Benoit, Douglas E. |
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| Zdroj: | Proceedings of SPIE; Nov1999, Issue 1, p46-55, 10p |
| Databáze: | Complementary Index |
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