New silica glass for 157-nm lithography.
| Autor: | Ikuta, Yoshiaki, Kikugawa, Shinya, Masui, Akio, Shimodaira, Noriaki, Yoshizawa, Shuhei, Hirano, Masahiro |
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| Zdroj: | Proceedings of SPIE; Nov1999, Issue 1, p827-833, 7p |
| Databáze: | Complementary Index |
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