Effect of the control of global planarity of intermetal dielectric layers on the lithographic process window.
| Autor: | Keysar, Shani, Markowitz, Leah, Ben-Gigi, Corin, Tweg, Rama, Margalit-Ilovich, Ayelet, Kepten, Avishai, Wachs, Amir, Shaviv, Roey |
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| Zdroj: | Proceedings of SPIE; Nov1999, Issue 1, p263-269, 7p |
| Databáze: | Complementary Index |
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