Methacrylate resists and antireflective coatings for 193-nm lithography.
Autor: | Taylor, Gary N., Trefonas III, Peter, Szmanda, Charles R., Barclay, George G., Kavanagh, Robert J., Blacksmith, Robert F., Joesten, Lori A., Monaghan, Michael J., Coley, Suzanne, Mao, Zhibiao, Cameron, James F., Hardy, Ricky, Gronbeck, Dana, Connolly, S. |
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Zdroj: | Proceedings of SPIE; Nov1999, Issue 1, p174-185, 12p |
Databáze: | Complementary Index |
Externí odkaz: |