Methacrylate resists and antireflective coatings for 193-nm lithography.

Autor: Taylor, Gary N., Trefonas III, Peter, Szmanda, Charles R., Barclay, George G., Kavanagh, Robert J., Blacksmith, Robert F., Joesten, Lori A., Monaghan, Michael J., Coley, Suzanne, Mao, Zhibiao, Cameron, James F., Hardy, Ricky, Gronbeck, Dana, Connolly, S.
Zdroj: Proceedings of SPIE; Nov1999, Issue 1, p174-185, 12p
Databáze: Complementary Index