Suppression of resist pattern deformation on SiON bottom antireflective layer in deep-UV lithography.
| Autor: | Yamanaka, Ryoko, Hattori, Takashi, Mine, Toshiyuki, Hattori, Keiko T., Tanaka, Toshihiko P., Terasawa, Tsuneo |
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| Zdroj: | Proceedings of SPIE; Nov1999, Issue 1, p198-204, 7p |
| Databáze: | Complementary Index |
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