Chemically amplified negative-tone resist using novel acryl polymer for 193-nm lithography.
| Autor: | Hada, Hideo, Iwai, Takeshi, Nakayama, Toshimasa |
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| Zdroj: | Proceedings of SPIE; Nov1999, Issue 1, p676-683, 8p |
| Databáze: | Complementary Index |
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