New technique for optical lithography at low k-factors.
| Autor: | Sewell, Harry, McCullough, Andrew W., Lauria, John E., Andresen, Keith W. |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov1999, Issue 1, p150-160, 11p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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| Autor: | Sewell, Harry, McCullough, Andrew W., Lauria, John E., Andresen, Keith W. |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov1999, Issue 1, p150-160, 11p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|