Development of Cr-based attenuated phase-shift mask process for 0.18-m device generation.
| Autor: | Kagami, Ichiro, Ishikawa, Kiichi, Kakuta, Daichi, Kawahira, Hiroichi |
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| Zdroj: | Proceedings of SPIE; Nov1999, Issue 1, p340-349, 10p |
| Databáze: | Complementary Index |
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