Design considerations for an electron-beam pattern generator for the 130-nm generation of masks.
| Autor: | Abboud, Frank E., Babin, Sergey V., Chakarian, Varoujan, Ghanbari, Abe, Innes, Robert, Raymond III, Frederick, Sagle, Allan L., Sauer, Charles A. |
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| Zdroj: | Proceedings of SPIE; Nov1999, Issue 1, p385-399, 15p |
| Databáze: | Complementary Index |
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