Improvement of post-exposure delay stability of chemically amplified positive resist.
| Autor: | Katoh, Kohji, Kasuya, Kei, Hashimoto, Michiaki, Arai, Tadashi, Sakamizu, Toshio |
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| Zdroj: | Proceedings of SPIE; Nov1999, Issue 1, p62-68, 7p |
| Databáze: | Complementary Index |
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