System architecture choices for an advanced mask writer (100 to 130 nm).
| Autor: | Chakarian, Varoujan, Raymond III, Frederick, Sauer, Charles A., Babin, Sergey V., Innes, Robert, Sagle, Allan L., Hofmann, Ulrich, Shamoun, Bassam, Trost, David, Ghanbari, Abe, Abboud, Frank E. |
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| Zdroj: | Proceedings of SPIE; Nov1999, Issue 1, p228-242, 15p |
| Databáze: | Complementary Index |
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