Next-generation lithography mask development at the NGL Mask Center of Competency.
| Autor: | Lercel, Michael J., Brooks, Cameron J., Racette, Kenneth C., Magg, Christopher, Lawliss, Mark, Caldwell, Neal, Jeffer, Raymond, Collins, Kevin W., Barrett, Monica, Nash, Steven C., Trybendis, Michael J., Bouchard, Lucien |
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| Zdroj: | Proceedings of SPIE; Nov1999, Issue 1, p804-813, 10p |
| Databáze: | Complementary Index |
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