Modeling of optical constants of materials comprising photolithographic masks in the VUV.
Autor: | Harrison, Dale A., Lam, John C., Li, George G., Forouhi, A. Rahim, Dao, Giang T. |
---|---|
Zdroj: | Proceedings of SPIE; Nov1999, Issue 1, p844-852, 9p |
Databáze: | Complementary Index |
Externí odkaz: |