Capping layers, cleaning method, and rapid thermal processing temperature on cobalt silicide formation.
| Autor: | Saigal, Dinesh, Lai, Gigi, Yang, Lisa, Su, Jingang, Ngan, Ken, Narasimhan, Murali K., Chen, Fusen E., Singhal, Ajay, Lopes, Dave, Lian, Sean, Cao, Wanqing, Tsai, Kevin, Lo, Patrick, Lee, Shih-Ked, Shih, James |
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| Zdroj: | Proceedings of SPIE; Nov1999, Issue 1, p84-95, 12p |
| Databáze: | Complementary Index |
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