Non-chemically amplified 248-nm resist materials.
| Autor: | Willson, C. Grant, Yueh, Wang, Leeson, Michael J., Steinhaeusler, Thomas, McAdams, Christopher L., Dammel, Ralph R., Sounik, James R., Aslam, M., Vicari, Richard, Sheehan, Michael T. |
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| Zdroj: | Proceedings of SPIE; Nov1997, Issue 1, p226-237, 12p |
| Databáze: | Complementary Index |
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