Design and process of a new DUV ARCH3 resist.
Autor: | Bantu, N. R., Maxwell, Brian, Medina, Arturo N., Sarubbi, Thomas R., Toukhy, Medhat A., Schacht, Hans-Thomas, Falcigno, Pasquale A., Muenzel, Norbert, Petschel, Klaus, Houlihan, Francis M., Nalamasu, Omkaram, Timko, Allen G. |
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Zdroj: | Proceedings of SPIE; Nov1997, Issue 1, p324-337, 14p |
Databáze: | Complementary Index |
Externí odkaz: |