Novel resist and exposure strategy for high-resolution electron-beam lithography.
| Autor: | Daumann, Walter, Bertenburg, Ralf M., van den Berg, Christophe, Tegude, Franz-Josef |
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| Zdroj: | Proceedings of SPIE; Nov1997, Issue 1, p155-162, 8p |
| Databáze: | Complementary Index |
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