Evaluation of a next-generation vector electron-beam mask pattern lithography system.
| Autor: | Rose, Carl M., Wang, Lawrence C., Justen, James P., Ferreira, Manny |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov1997, Issue 1, p64-73, 10p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|