Electron-beam and x-ray lithographic characteristics of the optical resist ARCH.
| Autor: | Novembre, Anthony E., Tarascon-Auriol, Regine G., Nalamasu, Omkaram, Fetter, Linus A., Bolan, Kevin J., Knurek, Chester S., Muenzel, Norbert, Holzwarth, Heinz E. |
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| Zdroj: | Proceedings of SPIE; Nov1995, Issue 1, p104-110, 7p |
| Databáze: | Complementary Index |
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