Printability of substrate and absorber defects on extreme ultraviolet lithographic masks.
| Autor: | Nguyen, Khanh B., Ray-Chaudhuri, Avijit K., Tichenor, Daniel A., Stulen, Richard H., Nissen, Rodney P., Berger, Kurt W., Paul, Phillip H., Tennant, Donald M., Fetter, Linus A., Windt, David L., Bjorkholm, John E., Freeman, Richard R. |
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| Zdroj: | Proceedings of SPIE; Nov1995, Issue 1, p331-339, 9p |
| Databáze: | Complementary Index |
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