Transfer mask for high-aspect-ratio microlithography.
| Autor: | Vladimirsky, Yuli, Vladimirsky, Olga, Saile, Volker, Morris, Kevin J., Klopf, J. Michael |
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| Zdroj: | Proceedings of SPIE; Nov1995, Issue 1, p391-396, 6p |
| Databáze: | Complementary Index |
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