Electrical linewidth measurements and simulations studying the effects of dose and gap on exposure latitude in x-ray lithography.
| Autor: | Nelson, Christine M., Hector, Scott D., Chu, William, Seese, Philip A., Thompson, Matthew A., Pol, Victor, McCord, Mark A., Oberschmidt, James M., Taylor, James W. |
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| Zdroj: | Proceedings of SPIE; Nov1995, Issue 1, p50-61, 12p |
| Databáze: | Complementary Index |
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