Resist contrast requirement for sub-0.25-m lithography.
| Autor: | Guo, Jerry Z., Novembre, Anthony E., Marchman, Herschel M., Abate, Joseph A., Frackoviak, John, Tomes, David N., Timko, Allen G., Celler, George K. |
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| Zdroj: | Proceedings of SPIE; Nov1995, Issue 1, p86-93, 8p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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