Optimization of CD control in DUV positive resists: influence of photoresist viscoelastic properties on PEB conditions.

Autor: Vinet, Francoise, Buffet, N., Fanton, Pierre, Pain, Laurent, Paniez, Patrick J.
Zdroj: Proceedings of SPIE; Nov1995, Issue 1, p202-210, 9p
Databáze: Complementary Index