Optimization of CD control in DUV positive resists: influence of photoresist viscoelastic properties on PEB conditions.
Autor: | Vinet, Francoise, Buffet, N., Fanton, Pierre, Pain, Laurent, Paniez, Patrick J. |
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Zdroj: | Proceedings of SPIE; Nov1995, Issue 1, p202-210, 9p |
Databáze: | Complementary Index |
Externí odkaz: |