Thermal rearrangement of novolak resins used in microlithography.
| Autor: | Hardy, Ricky, Zampini, Anthony, Monaghan, Michael J., O'Leary, Michael J., Cardin, William J., Eugster, Timothy J. |
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| Zdroj: | Proceedings of SPIE; Nov1995, Issue 1, p354-363, 10p |
| Databáze: | Complementary Index |
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