Applications of plasma-polymerized methylsilane as a resist and silicon dioxide precursor for 193- and 248-nm lithography.
| Autor: | Weidman, Timothy W., Joubert, Olivier P., Joshi, Ajey M., Kostelak, Robert L. |
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| Zdroj: | Proceedings of SPIE; Nov1995, Issue 1, p496-503, 8p |
| Databáze: | Complementary Index |
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