Antireflection coating process characterization and improvement for DUV lithography at 0.25 um: ground rules.
| Autor: | Sturtevant, John L., Chaara, M., Elliot, R., Hollifield Jr., Larry D., Soper, Robert A., Stark, David R., Thane, Nathan S., Petersen, John S. |
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| Zdroj: | Proceedings of SPIE; Nov1995, Issue 1, p582-593, 12p |
| Databáze: | Complementary Index |
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