Deep-UV attenuated phase-shift mask for a quarter-micrometer photolithography.
| Autor: | Kyoh, Suigen, Sakurai, Hideaki, Iwamatsu, Takayuki, Higashikawa, Iwao, Taniguchi, Rikiya, Watanabe, Hidehiro, Tuchiya, Takashi |
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| Zdroj: | Proceedings of SPIE; Nov1995, Issue 1, p300-309, 10p |
| Databáze: | Complementary Index |
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