Degradation of thin Si02 sidewall spacers during selective epitaxial growth for the fabrication of raised source/drain MOSFETs.
| Autor: | Unnikrishnan, Sreenath, Kim, Byeong Y., Wang, Chun-Lin, Wu, Yun-Kang, Kwong, Dim-Lee, Tasch, Al F. |
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| Zdroj: | Proceedings of SPIE; Nov1995, Issue 1, p246-255, 10p |
| Databáze: | Complementary Index |
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