Advanced silicon etching using high-density plasmas.
| Autor: | Bhardwaj, Jy K., Ashraf, Huma |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov1995, Issue 1, p224-233, 10p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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| Autor: | Bhardwaj, Jy K., Ashraf, Huma |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov1995, Issue 1, p224-233, 10p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|